DocumentCode
2885416
Title
Experimental and numerical analysis of the quantum yield [MOSFETs]
Author
Ielmini, D. ; Spinelli, A.S. ; Lacaita, A.L. ; DiMaria, D.J. ; Ghidini, G.
Author_Institution
Dipartimento di Elettronica, Politecnico di Milano, Italy
fYear
2000
fDate
10-13 Dec. 2000
Firstpage
331
Lastpage
334
Abstract
In this work it is shown that the quantum yield (QY) measurement cannot be used to extract the energy loss of the electrons responsible for the stress-induced leakage current (SILC). Time-relaxation experiments show that good correlation exists between the QY and the high-energy oxide states, while the SILC and the QY are not correlated. We suggest that the SILC is given by deep levels with a low ionization rate, while the QY is due to a small fraction of carriers tunneling through high-energy states with a high ionization efficiency. The conclusion is supported by numerical simulations.
Keywords
MOSFET; deep levels; energy loss of particles; impact ionisation; insulating thin films; leakage currents; semiconductor device models; tunnelling; MOSFETs; SILC; deep levels; energy loss; high-energy oxide states; high-energy states; ionization efficiency; ionization rate; quantum yield; stress-induced leakage current; time-relaxation experiments; tunneling; Current measurement; Electrons; Energy loss; Energy measurement; Ionization; Leakage current; Loss measurement; MOSFETs; Numerical analysis; Stress measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 2000. IEDM '00. Technical Digest. International
Conference_Location
San Francisco, CA, USA
Print_ISBN
0-7803-6438-4
Type
conf
DOI
10.1109/IEDM.2000.904323
Filename
904323
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