• DocumentCode
    2885416
  • Title

    Experimental and numerical analysis of the quantum yield [MOSFETs]

  • Author

    Ielmini, D. ; Spinelli, A.S. ; Lacaita, A.L. ; DiMaria, D.J. ; Ghidini, G.

  • Author_Institution
    Dipartimento di Elettronica, Politecnico di Milano, Italy
  • fYear
    2000
  • fDate
    10-13 Dec. 2000
  • Firstpage
    331
  • Lastpage
    334
  • Abstract
    In this work it is shown that the quantum yield (QY) measurement cannot be used to extract the energy loss of the electrons responsible for the stress-induced leakage current (SILC). Time-relaxation experiments show that good correlation exists between the QY and the high-energy oxide states, while the SILC and the QY are not correlated. We suggest that the SILC is given by deep levels with a low ionization rate, while the QY is due to a small fraction of carriers tunneling through high-energy states with a high ionization efficiency. The conclusion is supported by numerical simulations.
  • Keywords
    MOSFET; deep levels; energy loss of particles; impact ionisation; insulating thin films; leakage currents; semiconductor device models; tunnelling; MOSFETs; SILC; deep levels; energy loss; high-energy oxide states; high-energy states; ionization efficiency; ionization rate; quantum yield; stress-induced leakage current; time-relaxation experiments; tunneling; Current measurement; Electrons; Energy loss; Energy measurement; Ionization; Leakage current; Loss measurement; MOSFETs; Numerical analysis; Stress measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2000. IEDM '00. Technical Digest. International
  • Conference_Location
    San Francisco, CA, USA
  • Print_ISBN
    0-7803-6438-4
  • Type

    conf

  • DOI
    10.1109/IEDM.2000.904323
  • Filename
    904323