DocumentCode
2885687
Title
Downstream characterization of an oxygen atmospheric pressure plasma jet
Author
Yang, Y.J. ; Li, H.C. ; Hsu, C.C.
Author_Institution
Dept. of Chem. Eng., Nat. Taiwan Univ., Taipei, Taiwan
fYear
2011
fDate
26-30 June 2011
Firstpage
1
Lastpage
1
Abstract
Summary form only given. The characterization of the downstream of an oxygen atmospheric pressure plasma jet (APPJ) is performed. This APPJ is sustained by pulsed power with a repetitive frequency up to 25 kHz. The reactivity of the plasma at different operating conditions is characterized using the intensities of O2 (759 nm) and O (777 nm) optical emission lines. The jet downstream temperature is measured by a thermocouple. It is shown that the intensity of O2 emission is not sensitive to the flow rate while it increases with the increase in the applied voltage. O emission is only observed at high flow rate. The temperature measurement shows that it slightly increases with the applied voltage. At the jet exit, the temperature monotonically increases with the flow rate while at 1 cm downstream of the jet, it shows an opposite trend. It is shown that the existence of an external surface at the downstream greatly influences the emission spectra adjacent to the surface. When the jet downstream is shielded with a glass tube, the O radical emission intensity increases by more than one order of magnitude. Preliminary studies show that the presence of the surface potentially enhances certain surface reactions. Such an enhancement leads to the increase of the O radical density, as suggested by the spatial-resolved optical emission spectra.
Keywords
plasma density; plasma diagnostics; plasma flow; plasma jets; temperature measurement; thermocouples; downstream characterization; flow rate; glass tube; jet downstream temperature; optical emission lines; oxygen atmospheric pressure plasma jet; pressure 1 atm; radical density; repetitive frequency; spatial-resolved optical emission spectra; surface reactions; temperature measurement; thermocouple; Oxygen;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
Conference_Location
Chicago, IL
ISSN
0730-9244
Print_ISBN
978-1-61284-330-8
Electronic_ISBN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2011.5993377
Filename
5993377
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