Electrical Measurement of On-Mask Mismatch Resistor Structures

Author

Smith, S. ; Tsiamis, A. ; McCallum, M. ; Hourd, A.C. ; Stevenson, J.T.M. ; Walton, A.J.

Author_Institution

Univ. of Edinburgh, Edinburgh

fYear

2007

fDate

19-22 March 2007

Firstpage

3

Lastpage

8

Abstract

This paper describes the design and measurement of electrically measured test structures for the characterisation of dimensional mismatch in an advanced photomask making process. Test structures consisting of pairs of Kelvin connected bridge resistors have been fabricated on a chrome-on-quartz photomask plate. These have been electrically measured on-mask and the results used to obtain information about dimensional mismatch in the mask making process.

Keywords

bridge circuits; electric resistance measurement; masks; resistors; test equipment; Kelvin connected bridge resistors; chrome-on-quartz photomask plate; dimensional mismatch characterisation; electrical measurement; electrically measured test structures; on-mask mismatch resistor structures; photomask making process; Bridges; Chromium; Current measurement; Electric variables measurement; Electrical resistance measurement; Electronic equipment testing; Kelvin; Lithography; Microelectronics; Resistors;

fLanguage

English

Publisher

ieee

Conference_Titel

Microelectronic Test Structures, 2007. ICMTS '07. IEEE International Conference on

Conference_Location

Tokyo

Print_ISBN

1-4244-0781-8

Electronic_ISBN

1-4244-0781-8

Type

conf

DOI

10.1109/ICMTS.2007.374445

Filename

4252395