• DocumentCode
    2889397
  • Title

    Wafer packing for full mask exposure fabrication

  • Author

    Wu, C.-T. ; Lim, A. ; Du, D.

  • Author_Institution
    Dept. of Comput. Sci., Minnesota Univ., Minneapolis, MN, USA
  • fYear
    1991
  • fDate
    11-14 Nov. 1991
  • Firstpage
    52
  • Lastpage
    55
  • Abstract
    The authors formulate and classify the various models of the wafer packing problem for the full mask exposure technique. Since the wafer packing problem is NP-hard, the authors propose a good heuristic for it. Their experiments, on real test data, indicate that this heuristic is very effective as it provides considerable cost reduction when compared with the traditional way of producing chips.<>
  • Keywords
    circuit layout CAD; computational complexity; integrated circuit technology; NP-hard; full mask exposure fabrication; wafer packing; Application specific integrated circuits; Computer science; Costs; Design automation; Fabrication; Foundries; Manufacturing; Packaging; Semiconductor device modeling; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Computer-Aided Design, 1991. ICCAD-91. Digest of Technical Papers., 1991 IEEE International Conference on
  • Conference_Location
    Santa Clara, CA, USA
  • Print_ISBN
    0-8186-2157-5
  • Type

    conf

  • DOI
    10.1109/ICCAD.1991.185189
  • Filename
    185189