DocumentCode :
2890345
Title :
Simulation of anisotropic breakdown in 4H-SiC diodes
Author :
Bertilsson, K. ; Nilsson, H.E. ; Petersson, C.S.
Author_Institution :
Dept. of Inf. Technol., Mid-Sweden Univ., Sundsvall, Sweden
fYear :
2000
fDate :
2000
Firstpage :
118
Lastpage :
120
Abstract :
The breakdown characteristics of two-dimensional 4H-SiC diode structures have been studied using an anisotropic drift-diffusion model. The degree of anisotropy was estimated from recent full band Monte Carlo simulations. Identical diode structures have previously been used in the literature to measure the hole impact ionization coefficients of 4H-SiC. The reported measurements from different research groups show large differences in the impact ionization coefficients. The authors´ numerical simulations show that the differences in these measurements can be explained by the difference in device geometry used by the research teams a one considers an anisotropic impact ionization process. This indicates that it is very important to consider anisotropic impact ionization in the design and characterization of 4H-SiC power devices
Keywords :
Monte Carlo methods; hydrogen; impact ionisation; numerical analysis; power semiconductor devices; semiconductor device breakdown; semiconductor device models; silicon compounds; 4H-SiC power semiconductor diodes; H-SiC; anisotropic breakdown simulation; anisotropic drift-diffusion model; breakdown characteristics of; characterization; design; device geometry; full band Monte Carlo simulations; hole impact ionization coefficients; numerical simulations; Anisotropic magnetoresistance; Argon; Breakdown voltage; Electric breakdown; Impact ionization; Medical simulation; Schottky diodes; Silicon carbide; Solid state circuits; Thermal conductivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Computers in Power Electronics, 2000. COMPEL 2000. The 7th Workshop on
Conference_Location :
Blacksburg, VA
Print_ISBN :
0-7803-6561-5
Type :
conf
DOI :
10.1109/CIPE.2000.904702
Filename :
904702
Link To Document :
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