DocumentCode :
2890595
Title :
CIM approach for VLSI manufacturing
Author :
Komiya, Hiroyoshi ; Suizu, Katsumi
Author_Institution :
Mitsubishi Electr. Corp., Itami, Japan
fYear :
1989
fDate :
22-24 May 1989
Firstpage :
99
Abstract :
Summary form only given. For two types of production-small-variety/large-volume production and large-variety production-CIM (computer integrated manufacturing) lines have been developed and constructed for the whole production process from wafer fabrication to final testing. Each wafer fabrication line is constructed with a block structure having a somewhat different pattern, depending on the production type. The wafer testing, assembly, and final testing lines are constructed on the basis of a linear structure with multi-passages. For small-variety/large-volume production, it is sufficient for the characteristics of the block structure to approximate those of the linear structure closely. The wafer fabrication line is divided into several blocks according to the process steps. Each block consists of modules in which several pieces of equipment are integrated using transfer robots, an in/out station, and, in some cases, temporary storage. For large-variety production, a block structure similar to a job-shop structure is more suitable for improving flexibility. The wafer fabrication line is divided, for example, into two blocks for the master and the slice levels. However, this type of line needs sufficient capacity and efficiency in the work transport system and a complex distributed network hierarchy architecture for the control system
Keywords :
CAD/CAM; VLSI; integrated circuit manufacture; integrated circuit testing; manufacturing computer control; microassembling; production control; production testing; CAM; CIM; IC fabrication processes; VLSI manufacturing; assembly; block structure; computer integrated manufacturing; control system; distributed network hierarchy architecture; in/out station; job-shop structure; linear structure; production; temporary storage; transfer robots; wafer fabrication line; wafer testing; work transport system; Automatic control; Communication system control; Computer integrated manufacturing; Control systems; Fabrication; Manufacturing automation; Process control; Production; Testing; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing Science Symposium, 1989. ISMSS 1989., IEEE/SEMI International
Conference_Location :
Burlingame, CA
Type :
conf
DOI :
10.1109/ISMSS.1989.77254
Filename :
77254
Link To Document :
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