High power VUV pulse generation by anti-Stokes Raman scattering and its application to ablation processes

Author

Tashiro, Hideo ; Wada, Satoshi

Author_Institution

RIKEN, Inst. of Phys. & Chem. Res., Saitama, Japan

fYear

1993

fDate

15-18 Nov 1993

Firstpage

778

Lastpage

779

Abstract

In this paper, we report new approaches to increase the scattering efficiency to high-order anti-Stokes waves in stimulated Raman scattering together with characteristics of the VUV anti-Stokes beams. By modifying pump pulses to have the steep leading edge, the efficiency of VUV anti-Stokes generation was much improved. We also report developments of two types of the laser systems by ASRS in hydrogen for materials processing based on the fundamental research mentioned above and VUV laser ablations demonstrated of polytetrafluoroethylene (PTFE) films and quartz substrates

Keywords

Raman spectra; laser ablation; laser materials processing; optical films; optical pumping; polymer films; stimulated Raman scattering; VUV anti-Stokes beams; VUV anti-Stokes generation; ablation processes; anti-Stokes Raman scatterin; high power VUV pulse generation; high-order anti-Stokes waves; laser systems; materials processing; modifying pump pulses; polytetrafluoroethylene films; quartz substrates; scattering efficiency; steep leading edge; stimulated Raman scattering; Character generation; Hydrogen; Laser ablation; Laser excitation; Optical pulses; Power lasers; Pulse generation; Pump lasers; Raman scattering; Spectroscopy;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics Society Annual Meeting, 1993. LEOS '93 Conference Proceedings. IEEE

Conference_Location

San Jose, CA

Print_ISBN

0-7803-1263-5

Type

conf

DOI

10.1109/LEOS.1993.379423

Filename

379423