Title :
High power VUV pulse generation by anti-Stokes Raman scattering and its application to ablation processes
Author :
Tashiro, Hideo ; Wada, Satoshi
Author_Institution :
RIKEN, Inst. of Phys. & Chem. Res., Saitama, Japan
Abstract :
In this paper, we report new approaches to increase the scattering efficiency to high-order anti-Stokes waves in stimulated Raman scattering together with characteristics of the VUV anti-Stokes beams. By modifying pump pulses to have the steep leading edge, the efficiency of VUV anti-Stokes generation was much improved. We also report developments of two types of the laser systems by ASRS in hydrogen for materials processing based on the fundamental research mentioned above and VUV laser ablations demonstrated of polytetrafluoroethylene (PTFE) films and quartz substrates
Keywords :
Raman spectra; laser ablation; laser materials processing; optical films; optical pumping; polymer films; stimulated Raman scattering; VUV anti-Stokes beams; VUV anti-Stokes generation; ablation processes; anti-Stokes Raman scatterin; high power VUV pulse generation; high-order anti-Stokes waves; laser systems; materials processing; modifying pump pulses; polytetrafluoroethylene films; quartz substrates; scattering efficiency; steep leading edge; stimulated Raman scattering; Character generation; Hydrogen; Laser ablation; Laser excitation; Optical pulses; Power lasers; Pulse generation; Pump lasers; Raman scattering; Spectroscopy;
Conference_Titel :
Lasers and Electro-Optics Society Annual Meeting, 1993. LEOS '93 Conference Proceedings. IEEE
Conference_Location :
San Jose, CA
Print_ISBN :
0-7803-1263-5
DOI :
10.1109/LEOS.1993.379423
