DocumentCode :
2895916
Title :
Investigating the effect of wavelength and bias phase on the design of diffractive optical elements for 2 colour far-field pattern formation
Author :
Caley, A.J. ; Waddle, A.J. ; Taghizadeh, M.R.
Author_Institution :
Diffractive Opt. Group, Heriot-Watt Univ., Edinburgh, UK
fYear :
2005
fDate :
12-17 June 2005
Firstpage :
168
Abstract :
In this paper, we examine the effect of applying bias phase on the design of diffractive optical elements for two colour far-field pattern formations. We also explain how critical the choice of the two wavelengths on the quality of the generated output patterns and the effect of changing the ratio of the wavelengths.
Keywords :
diffractive optical elements; nonlinear optics; optical design techniques; pattern formation; bias phase technique; diffractive optical elements; two-colour far-field pattern formation; Algorithm design and analysis; Buildings; Displays; Nonlinear optics; Optical design; Optical diffraction; Optimized production technology; Pattern formation; Propagation delay; Quantization;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Europe, 2005. CLEO/Europe. 2005 Conference on
Print_ISBN :
0-7803-8974-3
Type :
conf
DOI :
10.1109/CLEOE.2005.1567956
Filename :
1567956
Link To Document :
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