DocumentCode
2895916
Title
Investigating the effect of wavelength and bias phase on the design of diffractive optical elements for 2 colour far-field pattern formation
Author
Caley, A.J. ; Waddle, A.J. ; Taghizadeh, M.R.
Author_Institution
Diffractive Opt. Group, Heriot-Watt Univ., Edinburgh, UK
fYear
2005
fDate
12-17 June 2005
Firstpage
168
Abstract
In this paper, we examine the effect of applying bias phase on the design of diffractive optical elements for two colour far-field pattern formations. We also explain how critical the choice of the two wavelengths on the quality of the generated output patterns and the effect of changing the ratio of the wavelengths.
Keywords
diffractive optical elements; nonlinear optics; optical design techniques; pattern formation; bias phase technique; diffractive optical elements; two-colour far-field pattern formation; Algorithm design and analysis; Buildings; Displays; Nonlinear optics; Optical design; Optical diffraction; Optimized production technology; Pattern formation; Propagation delay; Quantization;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Europe, 2005. CLEO/Europe. 2005 Conference on
Print_ISBN
0-7803-8974-3
Type
conf
DOI
10.1109/CLEOE.2005.1567956
Filename
1567956
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