Title :
Model-based control of semiconductor processing equipment: rapid thermal processing example
Author :
Gyurcsik, Ronald S. ; Cavin, Ralph K., III ; Sorrell, F.Y.
Author_Institution :
Dept. of Electr. & Comput. Eng., North Carolina State Univ., Raleigh, NC, USA
Abstract :
Analytical and empirical based models have been incorporated into the real-time control of rapid thermal processing equipment to improve both absolute temperature control and uniformity. This paper describes the special control needs of RTP systems along with a detailed description or an RTP model
Keywords :
integrated circuit technology; predictive control; process control; rapid thermal processing; real-time systems; temperature control; RTP model; absolute temperature control; model-based control; predictive control; rapid thermal processing; real-time control; semiconductor processing equipment; Control systems; Lamps; Process control; Rapid thermal annealing; Rapid thermal processing; Rough surfaces; Semiconductor process modeling; Surface roughness; Temperature control; Temperature sensors;
Conference_Titel :
Systems, Man and Cybernetics, 1993. 'Systems Engineering in the Service of Humans', Conference Proceedings., International Conference on
Conference_Location :
Le Touquet
Print_ISBN :
0-7803-0911-1
DOI :
10.1109/ICSMC.1993.384843
