DocumentCode
2897804
Title
Influence of the kind of absorbing liquid on fundamentals and application at laser-induced backside wet etching
Author
Böhme, Rico ; Zimmer, Klaus
Author_Institution
Leibniz-Inst. fur Oberflachenmodifizierung, Leipzig, Germany
fYear
2005
fDate
12-17 June 2005
Firstpage
284
Abstract
Wang et al. [1999] has introduced a method for laser etching of transparent materials using absorbing liquids called laser-induced backside wet etching (LIBWE). In this approach the etching process of the material is caused by the intense energy deposition near the interface to the solid due to the strong absorption of the high-energy laser light beam by the liquid. The kind and the properties of absorbing liquid are one of the important parameters of the etching process. The used liquid components influence the laser-induced decomposition chemistry directly and cause the formation of a surface layer containing the specific decomposition products. This laser-induced surface modification affects physical processes involved in laser etching and in consequence the etch ratesing and the applications of the etch process essentially basically.
Keywords
absorbing media; dielectric materials; laser ablation; laser beam etching; surface chemistry; surface morphology; absorbing liquid; etch ratesing; intense energy deposition; laser light beam absorption; laser-induced backside wet etching; laser-induced decomposition chemistry; laser-induced surface modification; physical process; solid interface; surface layer formation; transparent materials; Absorption; Chemical lasers; Laser applications; Laser beams; Laser theory; Liquids; Optical materials; Solid lasers; Surface emitting lasers; Wet etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Europe, 2005. CLEO/Europe. 2005 Conference on
Print_ISBN
0-7803-8974-3
Type
conf
DOI
10.1109/CLEOE.2005.1568069
Filename
1568069
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