DocumentCode
2897899
Title
Epitaxial thin films grown by pulsed laser deposition
Author
Blank, Dave H.A.
Author_Institution
Fac. of Sci. & Technol., Twente Univ., Enschede, Netherlands
fYear
2005
fDate
12-17 June 2005
Firstpage
291
Abstract
In this paper, we present the pulsed laser deposition (PLD) technique to control the growth of metal oxide materials at atomic level using high-pressure reflective high-energy electron diffraction and ellipsometry. These developments have helped to make PLD a grown-up technique to fabricate complex materials and structures.
Keywords
ellipsometry; epitaxial growth; optical fabrication; optical films; pulsed laser deposition; reflection high energy electron diffraction; ellipsometry; epitaxial thin film growth; high-pressure reflective high-energy electron diffraction; pulsed laser deposition; Atom lasers; Atomic beams; Atomic layer deposition; Electrons; Inorganic materials; Optical control; Optical materials; Optical pulses; Pulsed laser deposition; Sputtering;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Europe, 2005. CLEO/Europe. 2005 Conference on
Print_ISBN
0-7803-8974-3
Type
conf
DOI
10.1109/CLEOE.2005.1568075
Filename
1568075
Link To Document