DocumentCode
2898033
Title
Microstructural influence of OsRu thin films on dispenser cathodes
Author
Swartzentruber, Phillip ; Balk, T. John ; Roberts, Scott ; Effgen, Michael
Author_Institution
Univ. of Kentucky, Lexington, KY, USA
fYear
2012
fDate
24-26 April 2012
Firstpage
163
Lastpage
164
Abstract
Osmium-Ruthenium films were subjected to 1000 hours of close-spaced diode (CSD) testing and the film microstructures were evaluated in light of the CSD test results in order to generate improved film architectures for further CSD testing. Low knee temperatures correlated with a {10-10}/{10-11} film texture of annealed films.
Keywords
annealing; cathodes; diodes; osmium compounds; thin films; CSD test; OsRu; annealed films; close-spaced diode testing; dispenser cathodes; film microstructures; low knee temperatures; osmium-ruthenium thin films; Assembly; Cathodes; Coatings; Films; Microstructure; Substrates; Testing; M-coating; M-type; dispenser cathode; microstructure; osmium; ruthenium; thin film;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Electronics Conference (IVEC), 2012 IEEE Thirteenth International
Conference_Location
Monterey, CA
Print_ISBN
978-1-4673-0188-6
Electronic_ISBN
978-1-4673-0187-9
Type
conf
DOI
10.1109/IVEC.2012.6262116
Filename
6262116
Link To Document