DocumentCode :
2898033
Title :
Microstructural influence of OsRu thin films on dispenser cathodes
Author :
Swartzentruber, Phillip ; Balk, T. John ; Roberts, Scott ; Effgen, Michael
Author_Institution :
Univ. of Kentucky, Lexington, KY, USA
fYear :
2012
fDate :
24-26 April 2012
Firstpage :
163
Lastpage :
164
Abstract :
Osmium-Ruthenium films were subjected to 1000 hours of close-spaced diode (CSD) testing and the film microstructures were evaluated in light of the CSD test results in order to generate improved film architectures for further CSD testing. Low knee temperatures correlated with a {10-10}/{10-11} film texture of annealed films.
Keywords :
annealing; cathodes; diodes; osmium compounds; thin films; CSD test; OsRu; annealed films; close-spaced diode testing; dispenser cathodes; film microstructures; low knee temperatures; osmium-ruthenium thin films; Assembly; Cathodes; Coatings; Films; Microstructure; Substrates; Testing; M-coating; M-type; dispenser cathode; microstructure; osmium; ruthenium; thin film;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Electronics Conference (IVEC), 2012 IEEE Thirteenth International
Conference_Location :
Monterey, CA
Print_ISBN :
978-1-4673-0188-6
Electronic_ISBN :
978-1-4673-0187-9
Type :
conf
DOI :
10.1109/IVEC.2012.6262116
Filename :
6262116
Link To Document :
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