Title :
Pixel design and photodiode process technology for image sensor applications
Author :
Minkyu Kang ; Hoon Jang ; Sunjae Hwang ; Soeun Park ; Sanghwa Kim ; Hosoon Ko ; Changhun Han ; Joon Hwang
Author_Institution :
Dongbu HiTek Co., Ltd., Gamgok, South Korea
Abstract :
Image sensor is device that is widely used for many kinds of applications, as well as mobile phone camera and digital Still camera. The pixel scheme and the required key characteristics can vary depending on the application, and it is important to fabricate the optimal photodiode for the best image quality of the sensor. In this paper, we will explain key factors and techniques of fabricating photodiode, and introduce this factors and techniques as they apply to the actual products.
Keywords :
CMOS image sensors; cameras; photodetectors; digital still camera; image quality; image sensor; mobile phone camera; photodiode fabrication; pixel scheme; Capacitance; Dynamic range; Logic gates; Metals; Optical filters; Photodiodes; Transistors; image sensor; photodiode; pixel; process technology;
Conference_Titel :
SoC Design Conference (ISOCC), 2012 International
Conference_Location :
Jeju Island
Print_ISBN :
978-1-4673-2989-7
Electronic_ISBN :
978-1-4673-2988-0
DOI :
10.1109/ISOCC.2012.6407105
