Title :
Field electron emission from branch nanotubes film
Author :
Baoqing ; Tian, Shikai ; Yang, Zhonghai
Author_Institution :
Inst. of High Energy Electron., Univ. of Electron. Sci. & Technol. of China, Chengdu, China
Abstract :
In this article, the branch carbon nanotubes film was deposited by chemical vapor deposition (CVD), using a gas mixture of nitrogen, hydrogen and acetylene, the catalyzer is Ni film which was electroplated in the solution of NiSO4·6H2O, a little FeNO3 and H3BO4 in deion water with TEOF (Si(OC2H5)4). The SEM and TEM have been used to determine the structure of the films, which show that the diameters of the nanotubes are about 50nm. Field emission characterization has been measured on the carbon nanotubes films-anode setup in a vacuum chamber (p∼10-5Pa). The Fowler-Nordheim plot shows a good linear fit, indicating that the emission current is field emission.
Keywords :
carbon nanotubes; catalysts; chemical vapour deposition; electron field emission; hydrogen compounds; iron compounds; nickel compounds; silicon compounds; 50 nm; FeNO3; Fowler-Nordheim plot; H2O; H3BO4; NiSO4; SEM; SiOC2H54; TEM; TEOF; acetylene; branch carbon nanotubes film; catalyzer; cathode; chemical vapor deposition; deion water; emission current; field electron emission; field emission displays; gas mixture; vacuum chamber; Carbon nanotubes; Chemical vapor deposition; Electron emission; Flat panel displays; Scanning electron microscopy; Semiconductor films; Silicon; Steel; Temperature; Transmission electron microscopy;
Conference_Titel :
Vacuum Electron Sources Conference, 2004. Proceedings. IVESC 2004. The 5th International
Print_ISBN :
0-7803-8437-7
DOI :
10.1109/IVESC.2004.1414143
