Field electron emission from branch nanotubes film

Author

Baoqing ; Tian, Shikai ; Yang, Zhonghai

Author_Institution

Inst. of High Energy Electron., Univ. of Electron. Sci. & Technol. of China, Chengdu, China

fYear

2004

fDate

6-10 Sept. 2004

Firstpage

88

Lastpage

90

Abstract

In this article, the branch carbon nanotubes film was deposited by chemical vapor deposition (CVD), using a gas mixture of nitrogen, hydrogen and acetylene, the catalyzer is Ni film which was electroplated in the solution of NiSO₄·6H₂O, a little FeNO₃ and H₃BO₄ in deion water with TEOF (Si(OC₂H₅)₄). The SEM and TEM have been used to determine the structure of the films, which show that the diameters of the nanotubes are about 50nm. Field emission characterization has been measured on the carbon nanotubes films-anode setup in a vacuum chamber (p∼10_-5Pa). The Fowler-Nordheim plot shows a good linear fit, indicating that the emission current is field emission.

Keywords

carbon nanotubes; catalysts; chemical vapour deposition; electron field emission; hydrogen compounds; iron compounds; nickel compounds; silicon compounds; 50 nm; FeNO₃; Fowler-Nordheim plot; H₂O; H₃BO₄; NiSO₄; SEM; SiOC₂H₅₄; TEM; TEOF; acetylene; branch carbon nanotubes film; catalyzer; cathode; chemical vapor deposition; deion water; emission current; field electron emission; field emission displays; gas mixture; vacuum chamber; Carbon nanotubes; Chemical vapor deposition; Electron emission; Flat panel displays; Scanning electron microscopy; Semiconductor films; Silicon; Steel; Temperature; Transmission electron microscopy;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Electron Sources Conference, 2004. Proceedings. IVESC 2004. The 5th International

Print_ISBN

0-7803-8437-7

Type

conf

DOI

10.1109/IVESC.2004.1414143

Filename

1414143