DocumentCode :
2899395
Title :
Accurate determination of CMOS capacitance parameters using multilayer structures
Author :
De Lange, Willem
Author_Institution :
Intergraph Corp., Palo Alto, CA, USA
fYear :
1992
fDate :
16-19 Mar 1992
Firstpage :
57
Lastpage :
61
Abstract :
Focuses on the principles and experimental results of accurately measuring very small capacitances on a CMOS integrated circuit. An important feature is that stray capacitance to ground, on either or both nodes of the capacitor, does not alter the measured capacitance value. This allows integration of many relevant design features in small multilayer test structures. The author also presents an implementation of this method in a circuit that accurately extracts the capacitance between stacked layers and fringing capacitance between adjacent signal leads
Keywords :
CMOS integrated circuits; capacitance measurement; integrated circuit testing; CMOS capacitance parameters; adjacent signal leads; design features; fringing capacitance; measured capacitance value; multilayer structures; stacked layers; stray capacitance; test structures; CMOS integrated circuits; Capacitance measurement; Capacitors; Circuit testing; Integrated circuit measurements; Nonhomogeneous media; Parasitic capacitance; Switches; Variable structure systems; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronic Test Structures, 1992. ICMTS 1992. Proceedings of the 1992 International Conference on
Conference_Location :
San Diego, CA
Print_ISBN :
0-7803-0535-3
Type :
conf
DOI :
10.1109/ICMTS.1992.185938
Filename :
185938
Link To Document :
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