• DocumentCode
    2899516
  • Title

    Test structure and experimental analysis of bipolar hot-carrier degradation including stress field effect

  • Author

    Shimamoto, Hiromi ; Tanabe, Masamichi ; Onai, Takahiro ; Washio, Katsuyoshi ; Nakamura, Tohru

  • Author_Institution
    Hitachi Device Engineering Co. Ltd., Tokyo, Japan
  • fYear
    1992
  • fDate
    16-19 Mar 1992
  • Firstpage
    111
  • Lastpage
    114
  • Abstract
    Describes test transistors with different emitter-base breakdown voltages and an experimental analysis to predict hot-carrier degradation, including the stress field effect, in advanced high-speed self-aligned bipolar transistors. Test transistors were fabricated with different links of extrinsic to intrinsic bases, that is, transistors had different reverse I-V characteristics of the emitter-base junction. Experimental evidence showed that the dependence of the excess base current on stress can be expressed using emitter perimeter, reverse stress voltage, stress-enhancing voltage, and stress charge
  • Keywords
    bipolar transistors; electric breakdown of solids; hot carriers; semiconductor device testing; bipolar hot-carrier degradation; emitter perimeter; emitter-base breakdown voltages; extrinsic bases; high-speed self-aligned bipolar transistors; intrinsic bases; reverse I-V characteristics; stress charge; stress field effect; stress-enhancing voltage; Automatic testing; Bipolar transistors; Degradation; Hot carrier effects; Hot carriers; Monitoring; Performance analysis; Performance evaluation; Stress measurement; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronic Test Structures, 1992. ICMTS 1992. Proceedings of the 1992 International Conference on
  • Conference_Location
    San Diego, CA
  • Print_ISBN
    0-7803-0535-3
  • Type

    conf

  • DOI
    10.1109/ICMTS.1992.185949
  • Filename
    185949