DocumentCode
2899516
Title
Test structure and experimental analysis of bipolar hot-carrier degradation including stress field effect
Author
Shimamoto, Hiromi ; Tanabe, Masamichi ; Onai, Takahiro ; Washio, Katsuyoshi ; Nakamura, Tohru
Author_Institution
Hitachi Device Engineering Co. Ltd., Tokyo, Japan
fYear
1992
fDate
16-19 Mar 1992
Firstpage
111
Lastpage
114
Abstract
Describes test transistors with different emitter-base breakdown voltages and an experimental analysis to predict hot-carrier degradation, including the stress field effect, in advanced high-speed self-aligned bipolar transistors. Test transistors were fabricated with different links of extrinsic to intrinsic bases, that is, transistors had different reverse I -V characteristics of the emitter-base junction. Experimental evidence showed that the dependence of the excess base current on stress can be expressed using emitter perimeter, reverse stress voltage, stress-enhancing voltage, and stress charge
Keywords
bipolar transistors; electric breakdown of solids; hot carriers; semiconductor device testing; bipolar hot-carrier degradation; emitter perimeter; emitter-base breakdown voltages; extrinsic bases; high-speed self-aligned bipolar transistors; intrinsic bases; reverse I-V characteristics; stress charge; stress field effect; stress-enhancing voltage; Automatic testing; Bipolar transistors; Degradation; Hot carrier effects; Hot carriers; Monitoring; Performance analysis; Performance evaluation; Stress measurement; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronic Test Structures, 1992. ICMTS 1992. Proceedings of the 1992 International Conference on
Conference_Location
San Diego, CA
Print_ISBN
0-7803-0535-3
Type
conf
DOI
10.1109/ICMTS.1992.185949
Filename
185949
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