Title :
EEPROM-based Charging-Effects Sensors for Plasma Etching and Ion Implantation
Author_Institution :
Center for Integrated Systems, Stanford University
Keywords :
EPROM; Etching; Implants; Ion implantation; Monitoring; Plasma applications; Plasma devices; Plasma immersion ion implantation; Plasma measurements; Sensor phenomena and characterization;
Conference_Titel :
Wafer Level Reliability Workshop, 1992. Final Report., 1992 International
Conference_Location :
Lake Tahoe, CA, USA
DOI :
10.1109/IWLR.1992.657991
