DocumentCode
2899785
Title
Microfabrication of W band folded waveguide slow wave structure using two-step UV-LIGA technology
Author
Li, Hanyan ; Feng, Jinjun
Author_Institution
Nat. Key Lab. of Sci. & Technol. on Vacuum Electron., Beijing Vacuum Electron. Res. Inst., Beijing, China
fYear
2012
fDate
24-26 April 2012
Firstpage
387
Lastpage
388
Abstract
In this paper, We fabricate copper W-Band folded waveguide circuit with the beam tunnel by the optimized process based on two-step UV-LIGA using SU-8 negative photoresist followed by copper electroforming, and the experiment for the bonding of the two halves has been carried out.
Keywords
LIGA; copper; microfabrication; photoresists; waveguides; SU-8 negative photoresist; W band folded waveguide slow wave structure; beam tunnel; copper W-band folded waveguide circuit; copper electroforming; microfabrication; two-step UV-LIGA technology; Bonding; Copper; Etching; Laboratories; Plasma temperature; Resists; Vacuum technology; Microfabrication; SU8; TWT; Terahertz; UV-LIGA; d; folded waveguide;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Electronics Conference (IVEC), 2012 IEEE Thirteenth International
Conference_Location
Monterey, CA
Print_ISBN
978-1-4673-0188-6
Electronic_ISBN
978-1-4673-0187-9
Type
conf
DOI
10.1109/IVEC.2012.6262205
Filename
6262205
Link To Document