DocumentCode
2899983
Title
Spectral Ellipsometry for In Situ Real-Time Measurement and Control
Author
Duncan, Walter M. ; Henck, Steven A. ; Loewenstein, Lee M.
Author_Institution
Texas Instruments Incorporated
fYear
1992
fDate
25-28 Oct. 1992
Firstpage
117
Lastpage
121
Keywords
Ellipsometry; Fresnel reflection; Instruments; Nonhomogeneous media; Optical films; Optical reflection; Phase modulation; Plasma measurements; Spectroscopy; Thickness measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Wafer Level Reliability Workshop, 1992. Final Report., 1992 International
Conference_Location
Lake Tahoe, CA, USA
Type
conf
DOI
10.1109/IWLR.1992.657993
Filename
657993
Link To Document