Title :
Spectral Ellipsometry for In Situ Real-Time Measurement and Control
Author :
Duncan, Walter M. ; Henck, Steven A. ; Loewenstein, Lee M.
Author_Institution :
Texas Instruments Incorporated
Keywords :
Ellipsometry; Fresnel reflection; Instruments; Nonhomogeneous media; Optical films; Optical reflection; Phase modulation; Plasma measurements; Spectroscopy; Thickness measurement;
Conference_Titel :
Wafer Level Reliability Workshop, 1992. Final Report., 1992 International
Conference_Location :
Lake Tahoe, CA, USA
DOI :
10.1109/IWLR.1992.657993
