DocumentCode
2900493
Title
Study of the atomic and molecular radiation in shadow mask PDP
Author
Tu, Yan ; Yang, Lanlan ; Zhang, Xiong ; Wang, Baoping ; Yin, Hanchun ; Tong, Linsu
Author_Institution
Dept. of Electron. Eng., Southeast Univ., Nanjing, China
fYear
2004
fDate
6-10 Sept. 2004
Firstpage
187
Lastpage
189
Abstract
The discharge process in a discharge cell of shadow mask plasma display panel (SM-PDP) has been calculated by means of fluid model. The relation between content of xenon in Ne-Xe mixture gas, pressure and efficiency has been investigated for SM-PDP. Simulation results show that the resonance xenon responsible for 147nm UV decreases with the increasing of the content of xenon and pressure, while the molecular xenon, radiating 173nm UV, increases. The efficacy of SM-PDP could be enhanced further if the phosphor is selected carefully considering of this conclusion.
Keywords
flat panel displays; masks; neon; plasma displays; xenon; 147 nm; 173 nm; Ne; UV; Xe; atomic radiation; discharge process; fluid model; molecular radiation; phosphor; shadow mask PDP; shadow mask plasma display panel; Atomic measurements; Brightness; Costs; Electronic mail; Equations; Metastasis; Phosphors; Plasma displays; Resonance; Xenon;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Electron Sources Conference, 2004. Proceedings. IVESC 2004. The 5th International
Print_ISBN
0-7803-8437-7
Type
conf
DOI
10.1109/IVESC.2004.1414188
Filename
1414188
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