Title :
Prospect of the high efficiency for the VEST (via-hole etching for the separation of thin films) cell
Author :
Deguchi, M. ; Kawama, Y. ; Matsuno, Y. ; Nishimoto, Y. ; Morikawa, H. ; Arimoto, S. ; Kumabe, H. ; Murotani, T.
Author_Institution :
Semicond. Res. Lab., Mitsubishi Electr. Corp., Hyogo, Japan
Abstract :
The optimum design of the via-holes for the “VEST cell” (polycrystalline Si solar cell) was studied. Using a simple model, fill factors of the VEST cell were calculated. As for the via-hole distribution pattern, a square grid pattern was found to be most suitable from the view points of the cell performance and the ease of electrode design. It was found that a fill factor large enough (>0.79) for high efficiency can be obtained. A fabricated test cell showed the efficiency of 14.4%. Further Improvement (efficiency over 18%) is possibly expected
Keywords :
elemental semiconductors; etching; semiconductor materials; semiconductor thin films; silicon; solar cells; 14.4 percent; Si; electrode design; fill factors; high efficiency; polycrystalline Si solar cell; square grid pattern; thin film solar cells; thin films separation; via-hole distribution pattern; via-hole etching; Conductivity; Contact resistance; Current density; Electrodes; Etching; Ohmic contacts; P-n junctions; Transistors; Virtual manufacturing; Voltage;
Conference_Titel :
Photovoltaic Energy Conversion, 1994., Conference Record of the Twenty Fourth. IEEE Photovoltaic Specialists Conference - 1994, 1994 IEEE First World Conference on
Conference_Location :
Waikoloa, HI
Print_ISBN :
0-7803-1460-3
DOI :
10.1109/WCPEC.1994.519965
