Implementation of a TCAD based system to aid process transfer

Author

Nilsen, Vidar K. ; Walton, Anthony J. ; Donnelly, Jacqueline ; Horsburgh, G. ; Childs, Russell

Author_Institution

Dept. of Electron. & Electr. Eng., Edinburgh Univ., UK

fYear

1999

fDate

1999

Firstpage

54

Lastpage

57

Abstract

This paper describes a methodology for using TCAD as an aid to process transfer. The methodology is based on the use of a semi-automated system developed to reduce the effort required by the user in developing the TCAD code, thereby reducing the time taken to implement a process transfer. The issues involved in process transfer are considered, as is the role that TCAD can play in the procedure. The operation of the system is outlined and an example of its application is used to indicate its potential

Keywords

integrated circuit manufacture; semiconductor process modelling; technology CAD (electronics); TCAD; TCAD based system implementation; TCAD code development; TCAD methodology; process transfer; process transfer implementation time; semi-automated system; system operation; Application software; Consumer electronics; Doping profiles; Furnaces; Investments; Mass spectroscopy; National electric code; Semiconductor process modeling; Temperature; Thermal resistance;

fLanguage

English

Publisher

ieee

Conference_Titel

Statistical Metrology, 1999. IWSM. 1999 4th International Workshop on

Conference_Location

Kyoto

Print_ISBN

0-7803-5154-1

Type

conf

DOI

10.1109/IWSTM.1999.773195

Filename

773195