Title :
Giant magnetoelectric effect in nanofabricated Pb(Zr0.52Ti0.48)O3-Fe85B5Si10 cantilevers and resonant gate transistors
Author :
Li, Feng ; Fang, Zhao ; Misra, Rajiv ; Tadigadapa, Srinivas ; Zhang, Qiming ; Datta, Suman
Author_Institution :
Electr. Eng., Pennsylvania State Univ., University Park, PA, USA
Abstract :
Magnetoelectric (ME) laminates show higher ME coefficients than that of natural multiferroics (e.g. Cr2O3, BiTiO) by up to several orders of magnitude. Recent studies on bulk ME sensors using Fe85B5Si10 (Metglas) /polyvinylidene fluoride composite show a high ME voltage coefficient of 21V/cm·Oe at 20 Hz. However, bulk sensors suffer from poor epoxy bonding, aging and difficulty of integration with CMOS electronics. Here, we report, for the first time, the monolithic nanofabrication of Pb(Zr0.52Ti0.48)O3 (PZT)-Fe85B5Si10 ME cantilevers (Fig.1(a)) on silicon substrate which achieve 0.46 V/cm·Oe at 20 Hz and 1.8 V/cm·Oe at a resonance frequency of 8.4 KHz. Also, ME cantilever based resonant gate transistors (RGT) (Fig.1 (b)) has been designed and analyzed in comparison with ME cantilever. A 10X signal to noise ratio improvement can be reached by ME RGT. This shows the compatibility of the nanofabricated cantilever ME sensors with the Si process technology and paves the way for the future integration of MEMS based ultra-sensitive magnetic sensors with advanced Si nanoelectronics.
Keywords :
bonding processes; cantilevers; laminates; magnetoelectric effects; monolithic integrated circuits; nanoelectronics; nanofabrication; CMOS electronics; Fe85B5Si10; MEMS based ultra-sensitive magnetic sensors; Si; epoxy bonding; frequency 20 Hz; giant magnetoelectric effect; magnetoelectric laminates; monolithic nanofabrication; nanoelectronics; nanofabricated cantilever magnetoelectric sensors; natural multiferroics; polyvinylidene fluoride composite; resonant gate transistors; signal to noise ratio; Annealing; Magnetic fields; Magnetic resonance; Signal to noise ratio;
Conference_Titel :
Device Research Conference (DRC), 2011 69th Annual
Conference_Location :
Santa Barbara, CA
Print_ISBN :
978-1-61284-243-1
Electronic_ISBN :
1548-3770
DOI :
10.1109/DRC.2011.5994416