DocumentCode :
2903374
Title :
Influence of plasma spraying on emission of oxide cathode
Author :
Zhang, Min ; Wang, Xiaoxia ; Luo, Jirun ; Zhao, Qinglan
Author_Institution :
Key Lab. of High Power Microwave Sources & Technol., Chinese Acad. of Sci., Beijing, China
fYear :
2011
fDate :
21-24 Feb. 2011
Firstpage :
369
Lastpage :
370
Abstract :
This paper introduces plasma-sprayed technique, mainly focusing on the improved emission properties of plasma-sprayed oxide cathode and some problems to be solved in the future.
Keywords :
field emission; oxide coated cathodes; plasma arc spraying; emission property; oxide cathode emission; plasma spraying; plasma-sprayed oxide cathode; plasma-sprayed technique; Cathodes; Coatings; Materials; Metals; Plasmas; Spraying; emission current density; oxide cathode; plasma spraying;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Electronics Conference (IVEC), 2011 IEEE International
Conference_Location :
Bangalore
Print_ISBN :
978-1-4244-8662-5
Type :
conf
DOI :
10.1109/IVEC.2011.5747029
Filename :
5747029
Link To Document :
بازگشت