DocumentCode
2903875
Title
Variability in VLSI Circuits: Sources and Design Considerations
Author
Abu-Rahma, Mohamed H. ; Anis, Mohab
Author_Institution
Dept. of Electr. & Comput. Eng., Waterloo Univ., Ont.
fYear
2007
fDate
27-30 May 2007
Firstpage
3215
Lastpage
3218
Abstract
Process variations are becoming of increasing importance in nanometer CMOS regime. This paper reviews the challenges associated with variability and variation-tolerant design in nanometer CMOS. It highlights how design decisions, circuit techniques, and architecture decisions are modified to address the difficulties posed by the large increase in process variations.
Keywords
CMOS integrated circuits; integrated circuit design; nanoelectronics; VLSI circuits; architecture decisions; circuit techniques; design decisions; nanometer CMOS regime; process variations; variation-tolerant design; CMOS technology; Circuits; Design automation; Design engineering; Performance analysis; Propagation delay; Random variables; Timing; Tunneling; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Circuits and Systems, 2007. ISCAS 2007. IEEE International Symposium on
Conference_Location
New Orleans, LA
Print_ISBN
1-4244-0920-9
Electronic_ISBN
1-4244-0921-7
Type
conf
DOI
10.1109/ISCAS.2007.378156
Filename
4253363
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