• DocumentCode
    2904148
  • Title

    Investigating resistance of layers in nickel germanide formed on amorphous and crystalline germanium

  • Author

    Algahtani, Fahid ; Holland, Anthony ; Pirogova, Elena

  • Author_Institution
    Electr. & Comput. Eng., RMIT Univ., Melbourne, VIC, Australia
  • fYear
    2015
  • fDate
    7-9 May 2015
  • Firstpage
    480
  • Lastpage
    483
  • Abstract
    Nickel germanide formed on amorphous and crystalline germanium was investigated for sheet resistance, resistivity and specific contact resistivity of Al to the NiGe layers. This paper reports on electrical characterization of NiGe using both c-Ge and a-Ge.
  • Keywords
    aluminium; contact resistance; electrical resistivity; germanium alloys; nickel alloys; Ge; NiGe-Al; amorphous germanium; crystalline germanium; electrical characterization; layer resistance; nickel germanide layers; sheet resistance; specific contact resistivity; Conductivity; Germanium; Heat treatment; Nickel; Probes; Resistance; Resistance heating; Amorphous and Crystalline Germanium; Nickel Germanide; electrical characterization;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Topics in Electrical Engineering (ATEE), 2015 9th International Symposium on
  • Conference_Location
    Bucharest
  • Type

    conf

  • DOI
    10.1109/ATEE.2015.7133862
  • Filename
    7133862
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2904148