DocumentCode :
2904148
Title :
Investigating resistance of layers in nickel germanide formed on amorphous and crystalline germanium
Author :
Algahtani, Fahid ; Holland, Anthony ; Pirogova, Elena
Author_Institution :
Electr. & Comput. Eng., RMIT Univ., Melbourne, VIC, Australia
fYear :
2015
fDate :
7-9 May 2015
Firstpage :
480
Lastpage :
483
Abstract :
Nickel germanide formed on amorphous and crystalline germanium was investigated for sheet resistance, resistivity and specific contact resistivity of Al to the NiGe layers. This paper reports on electrical characterization of NiGe using both c-Ge and a-Ge.
Keywords :
aluminium; contact resistance; electrical resistivity; germanium alloys; nickel alloys; Ge; NiGe-Al; amorphous germanium; crystalline germanium; electrical characterization; layer resistance; nickel germanide layers; sheet resistance; specific contact resistivity; Conductivity; Germanium; Heat treatment; Nickel; Probes; Resistance; Resistance heating; Amorphous and Crystalline Germanium; Nickel Germanide; electrical characterization;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Topics in Electrical Engineering (ATEE), 2015 9th International Symposium on
Conference_Location :
Bucharest
Type :
conf
DOI :
10.1109/ATEE.2015.7133862
Filename :
7133862
Link To Document :
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