Title :
Trap-related delay analysis of self-aligned N-polar GaN/InAlN HEMTs with record extrinsic gm of 1105 mS/mm
Author :
Nidhi ; Dasgupta, S. ; Lu, J. ; Wu, F. ; Keller, S. ; Speck, J.S. ; Mishra, U.K.
Author_Institution :
ECE Dept., Univ. of California Santa Barbara, Santa Barbara, CA, USA
Abstract :
Ga-polar InAlN-based charge-inducing barrier for HEMTs have been recently demonstrated as a viable technology for high frequency applications due to high polarization charge and hence, low resistance channels. In this paper, we report on MBE-grown N-polar GaN/InAlN HEMTs with excellent DC and RF performance. There exists a discrepancy in the DC and RF data for N-polar MBE InAlN devices which is explained through several measurements and analysis and possible solutions are discussed.
Keywords :
III-V semiconductors; gallium compounds; high electron mobility transistors; indium compounds; molecular beam epitaxial growth; Ga-polar InAlN-based charge-inducing barrier; GaN-InAlN; MBE-grown N-polar GaN/InAlN HEMT; selfaligned N-polar GaN/InAlN HEMT; trap-related delay analysis; Gallium nitride; Nickel;
Conference_Titel :
Device Research Conference (DRC), 2011 69th Annual
Conference_Location :
Santa Barbara, CA
Print_ISBN :
978-1-61284-243-1
Electronic_ISBN :
1548-3770
DOI :
10.1109/DRC.2011.5994531