Production Automation for GaAs MMICs

The need for larger quantities of GaAs MMICs to support developmental and future production programs in radar and ECM systems has fostered the use of automated wafer fabrication and test equipment in the Pilot Production Line at Raytheon. The exclusive use of uniform, 3-inch diameter GaAs wafers has permitted the use of silicon processing equipment in the GaAs facility. Examples of improved process control and uniformity through automated equipment include the photolithography, cleaning, etching and testing areas. Increasing application of automated equipment in other labor-intensive portions of the MMIC process is inevitable.