• DocumentCode
    2906854
  • Title

    Bias effects on total dose-induced degradation of bipolar linear microcircuits for switched dose-rate irradiation

  • Author

    Velo, Y. Gonzalez ; Boch, J. ; Roche, N. J-H ; Pérez, S. ; Vaillé, J-R ; Dusseau, L. ; Saigné, F. ; Lorfèvre, E. ; Schrimpf, R.D. ; Chatry, C. ; Canals, A.

  • Author_Institution
    IES, Univ. Montpellier 2, Montpellier, France
  • fYear
    2009
  • fDate
    14-18 Sept. 2009
  • Firstpage
    308
  • Lastpage
    312
  • Abstract
    Accelerated test techniques are needed in order to qualify bipolar devices intended for use in low dose rate environments. Indeed, low dose rate is known to enhance degradation of bipolar devices. Moreover, the bias of microcircuits is known to play a significant role in device degradation. In this work, bipolar microcircuits are irradiated with different bias configurations during the irradiation. It is shown that the bias configuration leading to the worst-case degradation is dose-rate dependent. Moreover, if a time-saving evaluation technique based on dose-rate switching is to be used, the effect of bias has to investigated. Good agreement is found between the predictive curve obtained with the switched dose-rate technique and the low dose rate data.
  • Keywords
    bipolar integrated circuits; electron device testing; accelerated test technique; bipolar device; bipolar linear microcircuit; device degradation; dose-rate dependent; dose-rate switching; low dose rate environment; predictive curve; switched dose-rate irradiation; switched dose-rate technique; time-saving evaluation; total dose-induced degradation; worst-case degradation; Degradation; Life estimation; Performance evaluation; Pins; Radiation effects; Switches; Switching circuits; Accelerated Test Technique; Bipolar Technology; Enhanced Low Dose Rate Sensitivity (ELDRS); Total Dose; dose rate;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Radiation and Its Effects on Components and Systems (RADECS), 2009 European Conference on
  • Conference_Location
    Bruges
  • ISSN
    0379-6566
  • Print_ISBN
    978-1-4577-0492-5
  • Electronic_ISBN
    0379-6566
  • Type

    conf

  • DOI
    10.1109/RADECS.2009.5994665
  • Filename
    5994665