• DocumentCode
    2907621
  • Title

    Dislocation generation and propagation near the seed-crystal interface during MLEC crystal growth of sulfur-doped InP

  • Author

    Bliss, D.F. ; Zhao, J.Y. ; Bryant, G. ; Lancto, R. ; Dudley, M. ; Prasad, V.

  • Author_Institution
    Res. Lab., Hanscom AFB, MA, USA
  • fYear
    1999
  • fDate
    1999
  • Firstpage
    163
  • Lastpage
    166
  • Abstract
    The mechanism of dislocation generation and propagation in InP bulk crystals has been studied by controlling the shape and the growth rate of the neck. The effectiveness of deliberate necking in MLEC crystal growth of sulfur-doped InP crystals has been studied by X-ray white beam synchrotron radiation topography. For seeds oriented in the ⟨100⟩ direction, the twelve-fold slip systems are arrayed at 35° from the seed axis. Dislocations are observed in topographic views of the (110) cross-section of these crystals. The high density of dislocations generated at the seed-crystal interface is seen to propagate outward toward the periphery. Also seen are the striations associated with the sulfur distribution. These striations delineate the solid-melt interface as thermal excursions cause instantaneous changes in growth rate. For this study, the pulling rate was deliberately varied during growth, to determine the relationship between interface shape and dislocation density. The results show the necking process is of crucial importance to promote the growth of highly perfect InP single crystals
  • Keywords
    III-V semiconductors; X-ray topography; crystal growth from melt; dislocation density; dislocation motion; dislocation sources; indium compounds; slip; sulphur; InP:S; MLEC crystal growth; X-ray white beam synchrotron radiation topography; dislocation density; dislocation generation; dislocation propagation; interface shape; necking; pulling rate; seed-crystal interface; single crystals; solid-melt interface; striations; twelvefold slip systems; Crystals; Indium phosphide; Laboratories; Materials science and technology; Neck; Shape control; Silicon; Surfaces; Temperature; X-ray imaging;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 1999. IPRM. 1999 Eleventh International Conference on
  • Conference_Location
    Davos
  • ISSN
    1092-8669
  • Print_ISBN
    0-7803-5562-8
  • Type

    conf

  • DOI
    10.1109/ICIPRM.1999.773660
  • Filename
    773660