Title :
Transferred-substrate heterojunction bipolar transistor integrated circuit technology
Author :
Rodwell, Mark ; Lee, Q. ; Mensa, D. ; Guthrie, J. ; Betser, Y. ; Martin, S.C. ; Smith, R.P. ; Jaganathan, S. ; Mathew, T. ; Krishnan, P. ; Serhan, C. ; Long, S.
Author_Institution :
Dept. of Electr. & Comput. Eng., California Univ., Santa Barbara, CA, USA
Abstract :
Using substrate transfer processes, we have fabricated heterojunction bipolar transistors with 0.4 μm emitter-base and collector-base junctions, minimizing RC parasitics and increasing fmax to 820 GHz, the highest yet reported for a transistor. The process provides microstrip interconnects on a low-ετ polymer dielectric with a electroplated copper ground plane and substrate. Substrate thermal resistance is reduced 5:1 over InP. Important wiring parasitics, including wiring capacitance, ground via inductance, and IC-package ground-return inductance, are substantially reduced. Demonstrated ICs include lumped and distributed amplifiers with bandwidths to 85 GHz, master-slave flip-flops operable at over 48 GHz, and 50 GHz AGC/limiting amplifiers. Current efforts include further improvement in bandwidth, development of power devices, and demonstration of more complex mixed-signal ICs
Keywords :
III-V semiconductors; bipolar integrated circuits; heterojunction bipolar transistors; indium compounds; integrated circuit technology; substrates; 0.4 micron; 820 GHz; AGC; Cu; IC package ground return inductance; InP; RC parasitics; bandwidth; distributed amplifier; electroplated copper ground plane; ground via inductance; heterojunction bipolar transistor; integrated circuit technology; limiting amplifier; lumped amplifier; master-slave flip-flop; maximum frequency; microstrip interconnect; mixed-signal IC; polymer dielectric; power device; substrate transfer; thermal resistance; wiring capacitance; Bandwidth; Copper; Dielectric substrates; Distributed amplifiers; Heterojunction bipolar transistors; Inductance; Microstrip; Polymers; Thermal resistance; Wiring;
Conference_Titel :
Indium Phosphide and Related Materials, 1999. IPRM. 1999 Eleventh International Conference on
Conference_Location :
Davos
Print_ISBN :
0-7803-5562-8
DOI :
10.1109/ICIPRM.1999.773661