Title :
InP/GaAsSb/InP double heterojunction bipolar transistors with high cut-off frequencies and breakdown voltages
Author :
Matine, N. ; Dvorak, M.W. ; Xu, X.G. ; Watkins, S.P. ; Bolognesi, C.R.
Author_Institution :
Dept. of Phys., Simon Fraser Univ., Burnaby, BC, Canada
Abstract :
In this work, we report on the DC and microwave performance of MOCVD-grown carbon-doped InP/GaAsSb/InP double heterojunction transistors (DHBTs) with various collector thicknesses. The cut-off frequencies (and breakdown voltages) are 106 GHz (8 V), 82 GHz (10 V) and 40 GHz (15 V) for the 2000 Å, 3000 Å and 5000 Å, lightly doped collectors. The 106 GHz, which is the best fT ever reported in this material system, is obtained while maintaining a relatively high breakdown voltage (BVCEO=8 V). The lower cut-off frequencies obtained for the 3000 Å and 5000 Å, collectors are attributed to the longer transit time in the collector and also to the Kirk like limitation brought about by high current densities in the thicker collectors
Keywords :
III-V semiconductors; carbon; current density; gallium arsenide; gallium compounds; heterojunction bipolar transistors; indium compounds; microwave bipolar transistors; millimetre wave bipolar transistors; semiconductor device breakdown; semiconductor device measurement; 2000 to 5000 A; 40 to 106 GHz; 8 to 15 V; DC performance; DHBTs; InP/GaAsSb/InP double heterojunction bipolar transistors; InP:C-GaAsSb-InP; Kirk like limitation; MOCVD-grown carbon-doped InP/GaAsSb/InP double heterojunction transistors; breakdown voltages; collector; collector thickness; high breakdown voltage; high current densities; high cut-off frequencies; lightly doped collectors; microwave performance; transit time; Breakdown voltage; Cutoff frequency; Doping; Double heterojunction bipolar transistors; Electric breakdown; Electron emission; Indium phosphide; Low voltage; Microwave transistors; Photonic band gap;
Conference_Titel :
Indium Phosphide and Related Materials, 1999. IPRM. 1999 Eleventh International Conference on
Conference_Location :
Davos
Print_ISBN :
0-7803-5562-8
DOI :
10.1109/ICIPRM.1999.773663