• DocumentCode
    2907790
  • Title

    High reliable, low threshold 1.3 μm SL-QW PACIS (p-substrate Al-oxide Confined Inner Stripe) laser array

  • Author

    Iwai, N. ; Mukaihara, T. ; Yamanaka, N. ; Itoh, M. ; Arakawa, S. ; Shimizu, H. ; Kasukawa, A.

  • Author_Institution
    Yokohama R&D Lab., Furukawa Electr. Co. Ltd., Japan
  • fYear
    1999
  • fDate
    1999
  • Firstpage
    219
  • Lastpage
    222
  • Abstract
    A 1.3 μm Al-oxide confined inner stripe laser on p-InP substrate (PACIS) has been demonstrated for low cost laser array application. First, we have investigated the oxidation rate of Alx In1-xAs layer grown on InP substrate. The optimum conditions were found to be oxidation temperature=500°C, layer thickness=100 nm, and Al-contents=0.48 (lattice-match) taking oxidation rate and surface morphology into account. The 50 nm-thick Al0.48 In0.52As-oxide layer provides good current blocking for laser applications. Based on the above investigations, the fabricated PACIS laser shows a low threshold current of 4.0 mA and a high slope efficiency of 0.6 W/A. We have also confirmed high reliability under driving time over 3,000 hours at 85°C, 5 mW. A 22-channel laser array consisted of PACIS structure have the average threshold current of 3.98 mA and the standard deviation of 0.42 mA
  • Keywords
    III-V semiconductors; aluminium compounds; indium compounds; oxidation; quantum well lasers; semiconductor laser arrays; 1.3 mum; 100 nm; 3.98 mA; 4.0 mA; 5 mW; 50 nm; 500 degC; 85 degC; Al-contents; AlxIn1-xAs layer; AlInAs-InP; InP; current blocking; high reliability; high reliable low threshold 1.3 μm SL-QW PACIS; high slope efficiency; layer thickness; low cost laser array application; low threshold current; optimum conditions; oxidation rate; oxidation temperature; p-InP substrate; p-substrate Al-oxide confined inner stripe laser array; surface morphology; Chemical lasers; Indium phosphide; Laser applications; Nitrogen; Optical arrays; Optical microscopy; Oxidation; Surface morphology; Temperature; Threshold current;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 1999. IPRM. 1999 Eleventh International Conference on
  • Conference_Location
    Davos
  • ISSN
    1092-8669
  • Print_ISBN
    0-7803-5562-8
  • Type

    conf

  • DOI
    10.1109/ICIPRM.1999.773674
  • Filename
    773674