DocumentCode
2908164
Title
Fabrication and characterization of a new capacitive micromachined ultrasonic transducer (cMUT) using polysilicon as membrane and sacrificial layer material
Author
Buhrdorf, A. ; Lohfink, A. ; Junge, S. ; Eccardt, P.-C. ; Benecke, W.
Author_Institution
IMSAS, Bremen Univ., Germany
Volume
2
fYear
2003
fDate
5-8 Oct. 2003
Firstpage
1951
Abstract
This paper presents a new type of capacitive micromachined ultrasonic transducer (cMUT) using polysilicon for the membrane as well as for the sacrificial layer. Further features are the structured metallic bottom electrode, a silicon oxide isolation layer and a low stress polysilicon membrane combined with a defined electrically doped area. Moreover, the device is completely fabricated using surface micromachining technology. This technology has been applied to fabricate 1D cMUT arrays for operation in fluids in the range of 5 - 15 MHz. the characterization of the fabricated cMUTs have been performed by using optical LDV measurements of the membrane deflection in air using CW mode, LDV measurements in water burst operation mode and acoustic field measurements in water using hydrophone.
Keywords
capacitive sensors; micromachining; pressure sensors; silicon compounds; ultrasonic machining; ultrasonic transducers; 5 to 15 MHz; CW mode; acoustic field measurements; burst operation mode; capacitive micromachined ultrasonic transducer; hydrophone; membrane deflection; membrane material; metallic bottom electrode; optical LDV measurements; polysilicon membrane; pressure sensor; sacrificial layer material; silicon oxide isolation layer; surface micromachining; ultrasonic membrane cell; Acoustic measurements; Biomembranes; Electrodes; Fabrication; Isolation technology; Micromachining; Optical arrays; Silicon; Stress; Ultrasonic transducers;
fLanguage
English
Publisher
ieee
Conference_Titel
Ultrasonics, 2003 IEEE Symposium on
Print_ISBN
0-7803-7922-5
Type
conf
DOI
10.1109/ULTSYM.2003.1293299
Filename
1293299
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