Title :
Size and composition dependence of photoluminescence from In/sub x/Ga/sub 1-x/As quantum wires
Author :
Shim, B.R. ; Bando, K. ; Ota, T. ; Kobayashi, K. ; Nakashima, H.
Author_Institution :
Inst. of Sci. & Ind. Res., Osaka Univ., Japan
Abstract :
InGaAs quantum wires (QWRs) are grown on GaAs vicinal (110) surfaces with the giant step by MBE. These QWRs are induced by thickness modulation at coherently aligned giant step edges. Cross-sectional transmission electron microscope (TEM) observation shows that the InxGa(1-x)As is thicker at step edges than on terrace regions, resulting in QWRs formation. Photoluminescence (PL) measurements reveal that the PL peak of InxGa1-xAs QWRs shift to lower energies, compared to those of InxGa1-xAs quantum well (QWL) on GaAs (100) substrates grown at the same time. The PL of these InxGa1-xAs QWRs exhibited a strong polarization anisotropy which increased with increasing InAs composition. PL peak positions of thick InxGa1-xAs QWRs shift to higher energies with increasing InAs composition, and to lower energies with increasing growth thickness. PL peak positions of thin QWRs shift higher energies with increasing InAs composition due to reduced effective mass
Keywords :
III-V semiconductors; gallium arsenide; indium compounds; light polarisation; photoluminescence; semiconductor quantum wires; spectral line shift; transmission electron microscopy; In/sub x/Ga/sub 1-x/As quantum wires; InAs composition; InP; MBE; PL peak; PL peak positions; TEM; coherently aligned giant step edges; composition dependence; cross-sectional transmission electron microscopy; growth thickness; photoluminescence; polarization anisotropy; reduced effective mass; size dependence; terrace regions; thickness modulation; Anisotropic magnetoresistance; Effective mass; Energy measurement; Gallium arsenide; Indium gallium arsenide; Photoluminescence; Polarization; Time measurement; Transmission electron microscopy; Wires;
Conference_Titel :
Indium Phosphide and Related Materials, 1999. IPRM. 1999 Eleventh International Conference on
Conference_Location :
Davos, Switzerland
Print_ISBN :
0-7803-5562-8
DOI :
10.1109/ICIPRM.1999.773741