• DocumentCode
    2911855
  • Title

    The information-expert system for complex diagnostics and research of technological plasmas

  • Author

    Kresnin, Yu.A. ; Stervoedov, S.N.

  • Author_Institution
    Kharkov State Univ., Ukraine
  • fYear
    1996
  • fDate
    3-5 June 1996
  • Firstpage
    117
  • Abstract
    Summary form only given, as follows. The information-expert system for complex diagnostics and research of technological plasmas includes closely connected hardware and programme parts. The hardware consists of the set of intelligent sensors, possessing optical isolation on information channels, and functional modules, and incorporated crate CAMAC. A crate is connected by the serial interface with an IBM-compatible computer. The intelligent sensors are realized on the basis of a microcontroller Intel MCS51. They are used for multisensor and spectroscopic measurements of plasma parameters, laser measurement of plasma etched surface thickness, measurement of parameters of generators and power supplies of plasma sources. The information from the sensors is sent on functional modules for preliminary processing and compression, and further, through a controller crate-in computer. The programme part provides the exchange by information of computer with a crate, restores the amplitude-frequency and temporary characteristics of signals, compares them with chosen models of technological process, produces the recommendations on change of operating modes, optimizes technological process as a whole and carries out the documenting of researches.
  • Keywords
    plasma diagnostics; IBM-compatible computer; Intel MCS51; complex diagnostics; functional modules; incorporated crate CAMAC; information channels; information-expert system; intelligent sensors; laser measurement; microcontroller; multisensor measurements; operating modes; optical isolation; plasma etched surface thickness; plasma parameters; signal amplitude-frequency characteristics; signal temporary characteristics; spectroscopic measurements; technological plasma; Hardware; Intelligent sensors; Isolation technology; Plasma applications; Plasma diagnostics; Plasma materials processing; Plasma measurements; Plasma sources; Power measurement; Thickness measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
  • Conference_Location
    Boston, MA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-3322-5
  • Type

    conf

  • DOI
    10.1109/PLASMA.1996.550259
  • Filename
    550259