• DocumentCode
    2912352
  • Title

    Interaction of degradation mechanisms in Be-doped GaAs HBTs

  • Author

    Hill, D. ; Parsey, J.

  • Author_Institution
    Motorola DigitalDNA(TM) Lab., Tempe, AZ, USA
  • fYear
    2000
  • fDate
    5-8 Nov. 2000
  • Firstpage
    241
  • Lastpage
    244
  • Abstract
    Be-doped GaAs HBTs subjected to various life tests were found to degrade more rapidly than predicted by the current lifetime model. All failed devices which were examined exhibited the failure mode which is dominant for C-doped HBTs: increased base current at low voltages, accompanied by an increase in the base current ideality factor. Failed devices also showed an increase in the emitter-base turn-on voltage, indicating Be diffusion into the AlGaAs emitter. In addition to exhibiting two distinct degradation mechanisms, failure analysis data indicate interactions between these two mechanisms which support identification of the dominant failure mode under extended operation as recombination-enhanced defect reaction.
  • Keywords
    III-V semiconductors; beryllium; failure analysis; gallium arsenide; heterojunction bipolar transistors; semiconductor doping; Be diffusion; Be-doped GaAs HBT; GaAs:Be; base current; degradation mechanism; emitter-base turn-on voltage; failure analysis; ideality factor; life testing; lifetime model; recombination-enhanced defect reaction; Automatic testing; Degradation; Doping; Failure analysis; Gallium arsenide; Heterojunction bipolar transistors; Life testing; MMICs; Performance evaluation; Semiconductor process modeling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    GaAs IC Symposium, 2000. 22nd Annual
  • Conference_Location
    Seattle, WA, USA
  • ISSN
    1064-7775
  • Print_ISBN
    0-7803-5968-2
  • Type

    conf

  • DOI
    10.1109/GAAS.2000.906331
  • Filename
    906331