DocumentCode :
2912352
Title :
Interaction of degradation mechanisms in Be-doped GaAs HBTs
Author :
Hill, D. ; Parsey, J.
Author_Institution :
Motorola DigitalDNA(TM) Lab., Tempe, AZ, USA
fYear :
2000
fDate :
5-8 Nov. 2000
Firstpage :
241
Lastpage :
244
Abstract :
Be-doped GaAs HBTs subjected to various life tests were found to degrade more rapidly than predicted by the current lifetime model. All failed devices which were examined exhibited the failure mode which is dominant for C-doped HBTs: increased base current at low voltages, accompanied by an increase in the base current ideality factor. Failed devices also showed an increase in the emitter-base turn-on voltage, indicating Be diffusion into the AlGaAs emitter. In addition to exhibiting two distinct degradation mechanisms, failure analysis data indicate interactions between these two mechanisms which support identification of the dominant failure mode under extended operation as recombination-enhanced defect reaction.
Keywords :
III-V semiconductors; beryllium; failure analysis; gallium arsenide; heterojunction bipolar transistors; semiconductor doping; Be diffusion; Be-doped GaAs HBT; GaAs:Be; base current; degradation mechanism; emitter-base turn-on voltage; failure analysis; ideality factor; life testing; lifetime model; recombination-enhanced defect reaction; Automatic testing; Degradation; Doping; Failure analysis; Gallium arsenide; Heterojunction bipolar transistors; Life testing; MMICs; Performance evaluation; Semiconductor process modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
GaAs IC Symposium, 2000. 22nd Annual
Conference_Location :
Seattle, WA, USA
ISSN :
1064-7775
Print_ISBN :
0-7803-5968-2
Type :
conf
DOI :
10.1109/GAAS.2000.906331
Filename :
906331
Link To Document :
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