• DocumentCode
    2912711
  • Title

    Destruction of volatile organic compounds in air by a superimposed barrier discharge plasma reactor and activated carbon filter hybrid system

  • Author

    Urashima, K. ; Chang, J.S. ; Ito, T.

  • Author_Institution
    Dept. of Eng. Phys., McMaster Univ., Hamilton, Ont., Canada
  • Volume
    3
  • fYear
    1997
  • fDate
    5-9 Oct 1997
  • Firstpage
    1969
  • Abstract
    The superimposed barrier discharge and activated carbon filter hybrid systems are used to remove toluene and trichloro-ethylene (TCE) from air streams. The superimposed barrier discharge consists of silent and surface discharges. Experiments are conducted for the gas flow rate from 1 to 10 L/min., applied power from 0 to 7 W and toluene and TCE initial concentration from 0 to 2,000 ppm for 60 Hz AC applied voltage conditions. Discharge byproducts are measured by FTIR, GC and TLV VOC detector. The results shows that: (1) toluene decomposition rate monotonically increases with increasing applied power; (2) approximately 90% of toluene is removed by plasma reactors alone and up to 98% is removed by hybrid systems; (3) TCE removal rate by hybrid system is 90% and up to 50% is removed by a discharge reactor alone; (4) the pressure drop of the reactor and carbon filter increase with increasing gas flow rate; (5) TCE decomposition to form CO2, H2O and Cl2 and except CO2 and H2O these discharge byproducts are absorbed in activated carbon filters; (6) no COCl2, HCl, CO, NOx and O3 are observed in a discharge byproducts for the present range of experiments; and (7) the energy yield for toluene decompositions is up to 30 g/kWh, and up to 15 g/kWh for TCE decompositions
  • Keywords
    air pollution control; decomposition; discharges (electric); filtration; health hazards; plasma devices; 0 to 7 W; 60 Hz; activated carbon filter; air emissions control; decomposition rate; discharge byproducts; silent discharges; superimposed barrier discharge plasma reactor; surface discharges; toluene removal; trichloro-ethylene removal; volatile organic compounds destruction; Atmospheric-pressure plasmas; Filters; Inductors; Organic compounds; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma sources; Plasma temperature; Volatile organic compounds;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Industry Applications Conference, 1997. Thirty-Second IAS Annual Meeting, IAS '97., Conference Record of the 1997 IEEE
  • Conference_Location
    New Orleans, LA
  • ISSN
    0197-2618
  • Print_ISBN
    0-7803-4067-1
  • Type

    conf

  • DOI
    10.1109/IAS.1997.626330
  • Filename
    626330