• DocumentCode
    2913489
  • Title

    Monte Carlo simulation of the breakdown in copper vapour at low pressure

  • Author

    Loffhagen, Detlef ; Uhrlandt, Dirk ; Hencken, Kai

  • Author_Institution
    Leibniz Inst. for Plasma Sci. & Technol. (INP), Greifswald, Germany
  • fYear
    2010
  • fDate
    Aug. 30 2010-Sept. 3 2010
  • Firstpage
    7
  • Lastpage
    10
  • Abstract
    The breakdown conditions of copper vapour at low pressure are studied in a Monte Carlo simulation of electrons, copper ions and fast copper atoms. This is of interest for the dielectric breakdown strength of a vacuum interrupter after current zero, where hot vapour is still emitted from the electrodes. A one-dimensional model with given voltage drops in the kV range is applied to study the charge carrier multiplication in the gap. Initiated by the thermionic emission the electron impact ionization of copper atoms produces singly as well as twofold charged ions and causes electron avalanches. The simulation allows studying detailed energy distributions of electrons, ions and fast atoms across the gap. By scanning a large range of gas densities and electric voltages, the boundary of the breakdown region has been determined.
  • Keywords
    Monte Carlo methods; copper; electric breakdown; electron avalanches; electron impact ionisation; thermionic emission; vacuum interrupters; Cu; Monte Carlo simulation; charge carrier multiplication; copper ions; copper vapour; current zero; dielectric breakdown strength; electron avalanches; electron impact ionization; fast copper atoms; low pressure; thermionic emission; vacuum interrupter; Copper;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Discharges and Electrical Insulation in Vacuum (ISDEIV), 2010 24th International Symposium on
  • Conference_Location
    Braunschweig
  • ISSN
    1093-2941
  • Print_ISBN
    978-1-4244-8367-9
  • Electronic_ISBN
    1093-2941
  • Type

    conf

  • DOI
    10.1109/DEIV.2010.5625806
  • Filename
    5625806