DocumentCode :
2914366
Title :
Micromachined Faraday cup array using deep reactive ion etching
Author :
Darling, R.B. ; Scheidemann, A.A. ; Bhat, K.N. ; Tai-Chang Chen
Author_Institution :
Dept. of Electr. Eng., Washington Univ., Seattle, WA, USA
fYear :
2001
fDate :
25-25 Jan. 2001
Firstpage :
90
Lastpage :
93
Abstract :
A micromachined Faraday cup array (MFCA) for position sensitive ion detection has been developed using a deep reactive ion etching (DRIE) process. Linear, closely spaced arrays of 64, 128, and 256 cups have been produced with pitches of 250 /spl mu/m and 150 /spl mu/m. Low leakage MOS capacitors formed into DRIE trenches form effective ion collection traps with stable and electrostatically isolated capacitances. These closely spaced arrays of Faraday cups enable a new generation of compact mass spectrometers with true multi-channel detection capability. Since all of the incident ion flux is continuously intercepted by the array, no ion flux is lost as in scanning systems, and the overall sensitivity of the mass spectrometer is drastically improved by a factor approximately equal to the number of cups in the array. The MFCA is thus an ideal component for miniaturized mass spectrometers, ion beam profiling, and chemical analyzers which must work with very small sample volumes or high throughputs.
Keywords :
MOS capacitors; mass spectrometer accessories; micromachining; particle traps; position sensitive particle detectors; sputter etching; MOS capacitor; chemical analysis; deep reactive ion etching; electrostatic isolation; ion beam profiling; ion trap; mass spectrometer; micromachined Faraday cup array; multi-channel detection; position sensitive ion detector; Chemical analysis; Coaxial components; Dynamic range; Etching; Geometry; Mass spectroscopy; Parasitic capacitance; Position sensitive particle detectors; Sensor arrays; Stability;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 2001. MEMS 2001. The 14th IEEE International Conference on
Conference_Location :
Interlaken, Switzerland
ISSN :
1084-6999
Print_ISBN :
0-7803-5998-4
Type :
conf
DOI :
10.1109/MEMSYS.2001.906486
Filename :
906486
Link To Document :
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