DocumentCode
2914605
Title
Aggressive media exposed differential pressure sensor with a deposited membrane
Author
Bouaidat, S. ; Eriksen, G.F. ; de Reus, R. ; Andersen, P.E. ; Bouwstra, S.
Author_Institution
Mikroelektron. Centret, DTU, Lyngby, Denmark
fYear
2001
fDate
25-25 Jan. 2001
Firstpage
155
Lastpage
158
Abstract
A new piezoresistive differential pressure sensor design for harsh wet environments is presented. The sensor design is based on a deposited membrane, which is deposited on top of polysilicon interconnects and piezoresistors. Flat membrane surfaces are thereby achieved. This enables thin film protective coating using sputtered films, which usually have poor step coverage. The concept is demonstrated using both epipoly silicon and sputtered amorphous silicon as membrane materials and tantalum oxide as coating material. Using polysilicon piezoresistors, a sensitivity of 11.3 mV/V bar was obtained. Exposure of the sensors with sputtered amorphous silicon membranes to aggressive media with pH 11 and 70/spl deg/C for 20 hours did not change their performance.
Keywords
membranes; microsensors; piezoresistive devices; pressure sensors; protective coatings; sputtered coatings; 70 C; MEMS device; Si; TaO; amorphous silicon; deposited membrane; epipoly silicon; harsh wet environment; piezoresistive differential pressure sensor; polysilicon interconnect; protective coating; sputtered thin film; tantalum oxide; Amorphous silicon; Annealing; Biomembranes; Boron; Coatings; Costs; Piezoresistive devices; Protection; Silicon on insulator technology; Sputter etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2001. MEMS 2001. The 14th IEEE International Conference on
Conference_Location
Interlaken, Switzerland
ISSN
1084-6999
Print_ISBN
0-7803-5998-4
Type
conf
DOI
10.1109/MEMSYS.2001.906502
Filename
906502
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