• DocumentCode
    2914605
  • Title

    Aggressive media exposed differential pressure sensor with a deposited membrane

  • Author

    Bouaidat, S. ; Eriksen, G.F. ; de Reus, R. ; Andersen, P.E. ; Bouwstra, S.

  • Author_Institution
    Mikroelektron. Centret, DTU, Lyngby, Denmark
  • fYear
    2001
  • fDate
    25-25 Jan. 2001
  • Firstpage
    155
  • Lastpage
    158
  • Abstract
    A new piezoresistive differential pressure sensor design for harsh wet environments is presented. The sensor design is based on a deposited membrane, which is deposited on top of polysilicon interconnects and piezoresistors. Flat membrane surfaces are thereby achieved. This enables thin film protective coating using sputtered films, which usually have poor step coverage. The concept is demonstrated using both epipoly silicon and sputtered amorphous silicon as membrane materials and tantalum oxide as coating material. Using polysilicon piezoresistors, a sensitivity of 11.3 mV/V bar was obtained. Exposure of the sensors with sputtered amorphous silicon membranes to aggressive media with pH 11 and 70/spl deg/C for 20 hours did not change their performance.
  • Keywords
    membranes; microsensors; piezoresistive devices; pressure sensors; protective coatings; sputtered coatings; 70 C; MEMS device; Si; TaO; amorphous silicon; deposited membrane; epipoly silicon; harsh wet environment; piezoresistive differential pressure sensor; polysilicon interconnect; protective coating; sputtered thin film; tantalum oxide; Amorphous silicon; Annealing; Biomembranes; Boron; Coatings; Costs; Piezoresistive devices; Protection; Silicon on insulator technology; Sputter etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2001. MEMS 2001. The 14th IEEE International Conference on
  • Conference_Location
    Interlaken, Switzerland
  • ISSN
    1084-6999
  • Print_ISBN
    0-7803-5998-4
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2001.906502
  • Filename
    906502