Influence of nitrogen pressure on silicon content in Ti-Si-N coatings deposited by the vacuum-arc method

Author

Aksenov, I.I. ; Belous, V.A. ; Zadneprovskiy, Yu.A. ; Kuprin, A.S. ; Lomino, N.S. ; Ovcharenko, V.D. ; Sobol, O.V.

Author_Institution

“Kharkov Inst. of Phys. & Technol.”, Nat. Sci. Center, Kharkov, Ukraine

fYear

2010

fDate

Aug. 30 2010-Sept. 3 2010

Firstpage

497

Lastpage

500

Abstract

Influence of nitrogen pressure on silicon content in Ti-Si-N coatings deposited by the vacuum-arc method using Ti_0,96-Si_0,04 alloy as a consumable cathode material was was investigated. It is found out, that the silicon content in coatings regardless of deposition conditions is lower than in the cathode. In pressure range from 5·10^-4 to 10^-3 Torr, film has minimal silicon content (~ 0.4 wt. %) and maximal hardness (35 GPa). It is supposed, that the extremum character of coating silicon concentration and hardness dependencies on nitrogen pressure is a result of distinction of structure-phase composition of the coatings obtained at different pressure.

Keywords

cathodes; nitrogen; silicon alloys; titanium alloys; vacuum arcs; vacuum insulation; Ti-Si-N; cathode material; nitrogen pressure; silicon concentration coating; structure-phase composition; vacuum-arc method; Anodes; Cathodes; Coatings; Nitrogen; Plasmas; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Discharges and Electrical Insulation in Vacuum (ISDEIV), 2010 24th International Symposium on

Conference_Location

Braunschweig

ISSN

1093-2941

Print_ISBN

978-1-4244-8367-9

Electronic_ISBN

1093-2941

Type

conf

DOI

10.1109/DEIV.2010.5625887

Filename

5625887