• DocumentCode
    2917736
  • Title

    Photoluminescence and Raman properties of porous silicon at different etching times and current densities

  • Author

    Yusop, S.F.M. ; Abdullah, S. ; Rusop, M.

  • Author_Institution
    NANO-SciTech Centre, UiTM Shah Alam, Shah Alam, Malaysia
  • fYear
    2010
  • fDate
    11-14 April 2010
  • Firstpage
    443
  • Lastpage
    446
  • Abstract
    We study the Photoluminescence (PL) and raman properties of porous silicon as function of etching time and current density. The result shows that PL spectra give a blueshift trend and increasing intensity when etching time and current density increase. Samples that strongly emit at visible range then were analyzed using Raman measurement. As etching time increase, it shows that the Raman spectra of porous silicon slightly shift from bulk crystalline Silicon spectrum. A full half width maximum (FWHM) is gradually increasing with increasing current density.
  • Keywords
    Raman spectra; current density; elemental semiconductors; etching; photoluminescence; porous semiconductors; silicon; visible spectra; Raman properties; Raman spectra; Si; blueshift; current density; etching time; photoluminescence; porous silicon; visible range; Crystallization; Current density; Etching; Ethanol; Hafnium; Methanol; Nanobioscience; Photoluminescence; Raman scattering; Silicon; FWHM; PL; Photoluminescence; Porous Silicon; Raman;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Devices, Systems and Applications (ICEDSA), 2010 Intl Conf on
  • Conference_Location
    Kuala Lumpur
  • Print_ISBN
    978-1-4244-6629-0
  • Type

    conf

  • DOI
    10.1109/ICEDSA.2010.5503020
  • Filename
    5503020