DocumentCode
2917736
Title
Photoluminescence and Raman properties of porous silicon at different etching times and current densities
Author
Yusop, S.F.M. ; Abdullah, S. ; Rusop, M.
Author_Institution
NANO-SciTech Centre, UiTM Shah Alam, Shah Alam, Malaysia
fYear
2010
fDate
11-14 April 2010
Firstpage
443
Lastpage
446
Abstract
We study the Photoluminescence (PL) and raman properties of porous silicon as function of etching time and current density. The result shows that PL spectra give a blueshift trend and increasing intensity when etching time and current density increase. Samples that strongly emit at visible range then were analyzed using Raman measurement. As etching time increase, it shows that the Raman spectra of porous silicon slightly shift from bulk crystalline Silicon spectrum. A full half width maximum (FWHM) is gradually increasing with increasing current density.
Keywords
Raman spectra; current density; elemental semiconductors; etching; photoluminescence; porous semiconductors; silicon; visible spectra; Raman properties; Raman spectra; Si; blueshift; current density; etching time; photoluminescence; porous silicon; visible range; Crystallization; Current density; Etching; Ethanol; Hafnium; Methanol; Nanobioscience; Photoluminescence; Raman scattering; Silicon; FWHM; PL; Photoluminescence; Porous Silicon; Raman;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Devices, Systems and Applications (ICEDSA), 2010 Intl Conf on
Conference_Location
Kuala Lumpur
Print_ISBN
978-1-4244-6629-0
Type
conf
DOI
10.1109/ICEDSA.2010.5503020
Filename
5503020
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