Title :
Octree-search kinetic monte carlo algorithm for the simulation of complex 3D MEMS structures
Author :
Xing, Y. ; Gosálvez, M.A. ; Sato, K.
Author_Institution :
Southeast Univ., Nanjing
Abstract :
This paper presents a kinetic Monte Carlo (KMC) method based on an octree search algorithm and data representation for the simulation of complex MEMS structures created by the propagation of a dynamic surface. We consider the case of wet and DRIE etching of silicon, including multi-masking by silicon dioxide and nitride layers, as well as sacrificial layers. The algorithm leads to a faster tree-based search, efficient updating and good modeling ability for dynamic surfaces. Typically it achieves speedup factors of 3-4 over a state-of-the-art technique. Meanwhile, it reduces the computational memory by 50-80% over the dynamic method, with this factor increasing for larger scale simulations.
Keywords :
Monte Carlo methods; lithography; masks; micromechanical devices; octrees; silicon compounds; sputter etching; DRIE etching; Si; complex 3D MEMS structure simulation; computational memory; data representation; faster tree-based search; larger scale simulations; multimasking; octree search algorithm; octree-search kinetic Monte Carlo algorithm; silicon dioxide layers; silicon nitride layers; state-of-the-art technique; wet etching; Binary trees; Computational modeling; Etching; Kinetic theory; Laboratories; Mechanical engineering; Micromechanical devices; Monte Carlo methods; Optimization methods; Tree data structures;
Conference_Titel :
Micro Electro Mechanical Systems, 2008. MEMS 2008. IEEE 21st International Conference on
Conference_Location :
Tucson, AZ
Print_ISBN :
978-1-4244-1792-6
Electronic_ISBN :
1084-6999
DOI :
10.1109/MEMSYS.2008.4443658