DocumentCode
2918056
Title
Octree-search kinetic monte carlo algorithm for the simulation of complex 3D MEMS structures
Author
Xing, Y. ; Gosálvez, M.A. ; Sato, K.
Author_Institution
Southeast Univ., Nanjing
fYear
2008
fDate
13-17 Jan. 2008
Firstpage
323
Lastpage
326
Abstract
This paper presents a kinetic Monte Carlo (KMC) method based on an octree search algorithm and data representation for the simulation of complex MEMS structures created by the propagation of a dynamic surface. We consider the case of wet and DRIE etching of silicon, including multi-masking by silicon dioxide and nitride layers, as well as sacrificial layers. The algorithm leads to a faster tree-based search, efficient updating and good modeling ability for dynamic surfaces. Typically it achieves speedup factors of 3-4 over a state-of-the-art technique. Meanwhile, it reduces the computational memory by 50-80% over the dynamic method, with this factor increasing for larger scale simulations.
Keywords
Monte Carlo methods; lithography; masks; micromechanical devices; octrees; silicon compounds; sputter etching; DRIE etching; Si; complex 3D MEMS structure simulation; computational memory; data representation; faster tree-based search; larger scale simulations; multimasking; octree search algorithm; octree-search kinetic Monte Carlo algorithm; silicon dioxide layers; silicon nitride layers; state-of-the-art technique; wet etching; Binary trees; Computational modeling; Etching; Kinetic theory; Laboratories; Mechanical engineering; Micromechanical devices; Monte Carlo methods; Optimization methods; Tree data structures;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2008. MEMS 2008. IEEE 21st International Conference on
Conference_Location
Tucson, AZ
ISSN
1084-6999
Print_ISBN
978-1-4244-1792-6
Electronic_ISBN
1084-6999
Type
conf
DOI
10.1109/MEMSYS.2008.4443658
Filename
4443658
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