• DocumentCode
    2918182
  • Title

    Fabrication of microprobes on a ultrathick glass substrate with narrow-pitch electrical feedthroughs for next-generation lsi burn-in tests

  • Author

    Tanaka, S. ; Fujimoto, S. ; Ito, O. ; Choe, S.-H. ; Esashi, M.

  • Author_Institution
    Tohoku Univ., Sendai
  • fYear
    2008
  • fDate
    13-17 Jan. 2008
  • Firstpage
    347
  • Lastpage
    350
  • Abstract
    This paper describes microprobes fabricated on a thick glass substrate with narrow-pitch electrical feedthroughs for the application to the next-generation LSI burn-in test. The feedthrough glass substrate was sliced off from the block of stacked Pyrex glass substrates with thin metal lines. The pitch of the feedthroughs in one direction is defined by photolithography, and thus can be made sufficiently small. The probes were made of heavily-boron-diffused silicon, and fixed on the feedthrough glass substrate by anodic bonding. The feedthrough glass substrate was evaluated in terms of the resistance of the feedthroughs. The probes were evaluated in terms of mechanical robustness against overdrive.
  • Keywords
    bonding processes; integrated circuit testing; large scale integration; micromechanical devices; photolithography; probes; wafer-scale integration; LSI burn-in test; LSI wafer; MEMS-based probes; anodic bonding; heavily-boron-diffused silicon; mechanical robustness; microprobes fabrication; narrow-pitch electrical feedthroughs; photolithography; stacked Pyrex glass substrates; stacked-type feedthrough glass substrate; thin metal lines; ultrathick glass substrate; Contacts; Fabrication; Glass; Large scale integration; Probes; Silicon; Substrates; Testing; Thermal expansion; Wafer bonding;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2008. MEMS 2008. IEEE 21st International Conference on
  • Conference_Location
    Tucson, AZ
  • ISSN
    1084-6999
  • Print_ISBN
    978-1-4244-1792-6
  • Electronic_ISBN
    1084-6999
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2008.4443664
  • Filename
    4443664