Title :
Atomic layer deposited alumina for micromachined resonators
Author :
Chang, Y.J. ; Cobry, K. ; Bright, V.M.
Author_Institution :
Univ. of Colorado, Boulder
Abstract :
In this work, atomic layer deposited (ALD) alumina (AI2O3) has been demonstrated as the structural material for a micro-resonator for the first time. An electrostatically actuated micro-bridge made of Cr and ALD AI2O3 was used as a resonator. The resonator was formed by simple wet- and dry-etching processes. The static displacement profile of the micro-resonator was then measured by an optical interferometer. A model of a pinned-pinned beam with axial stress of 250 MPa is used to fit the measured data. An optical method was used to measure the resonant frequency modes. The fundamental frequency of the resonator was measured around 200 kHz. Higher modes of resonance were also observed and fitted with the analytical model.
Keywords :
alumina; atomic layer deposition; etching; micromachining; micromechanical resonators; alumina; etching processes; micromachined resonators; optical interferometer; pinned-pinned beam; Artificial intelligence; Atomic layer deposition; Chromium; Displacement measurement; Electrostatic measurements; Frequency measurement; Optical interferometry; Optical resonators; Resonant frequency; Stress;
Conference_Titel :
Micro Electro Mechanical Systems, 2008. MEMS 2008. IEEE 21st International Conference on
Conference_Location :
Tucson, AZ
Print_ISBN :
978-1-4244-1792-6
Electronic_ISBN :
1084-6999
DOI :
10.1109/MEMSYS.2008.4443674