DocumentCode
2918609
Title
Nanoelectronics: silicon technology roadmap and emerging nanoelectronics technology in Taiwan
Author
Wey, Chin-Long
Author_Institution
Dept. of Electr. Eng., Nat. Central Univ., Chung-li, Taiwan
fYear
2005
fDate
6-10 Nov. 2005
Abstract
This article presents the current research and development of nanoelectronics in Taiwan and its roadmaps. The focus of the nonelectronics is placed on the semiconductor memories, such as volatile DRAMs, nonvolatile MRAMs and OUMs, and CMOS organic electronics. The vision of the National nanoelectronics R&D program is to enhance the technology development of next generation semiconductor memories for the products of high-speed, high-density, and low-power applications, and to establish the world-class nanoelectronics R&D platform supporting local semiconductor manufacturers to develop advanced technology for next generation semiconductor ICs. This article reviews the major features of Taiwan´s IC industry, and its current development.
Keywords
integrated memory circuits; nanoelectronics; research and development; silicon; CMOS organic electronics; National nanoelectronics R&D program; OUM; Taiwan IC industry; nanoelectronics; nonvolatile MRAM; semiconductor memories; silicon technology; volatile DRAM; CMOS technology; Companies; Foundries; Job design; Manufacturing industries; Nanoelectronics; Research and development; Semiconductor device manufacture; Semiconductor memory; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Industrial Electronics Society, 2005. IECON 2005. 31st Annual Conference of IEEE
Print_ISBN
0-7803-9252-3
Type
conf
DOI
10.1109/IECON.2005.1569281
Filename
1569281
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