Displacement measurement with submicron resolution using photo-electromotive force effect and frequency-modulated lasers

Author

Jin, Fan ; Khurgin, Jacob B. ; Wang, Chua-Chin ; Trivedi, Soham ; Gabay, Y. ; Gad, Emad ; Temple, D.A.

Author_Institution

Dept. of Electr. & Comput. Eng., Johns Hopkins Univ., Baltimore, MD, USA

fYear

2000

fDate

7-12 May 2000

Firstpage

102

Lastpage

103

Abstract

Summary form only given.Two noncollinear coherent light waves interfering inside a semi-insulating semiconductor form an optical pattern (grating). Transient photoelectromotive force (photo-EMF) current can be generated when the phase of the grating is changed. Attractive features of the photo-EMF technique include ruggedness and comparative simplicity of system setup and signal processing. It has been successfully incorporated in vibrometry, displacement measurement, etc. We report a novel scheme for wide range and the high-resolution displacement measurement with photo-EMF effect that requires no moving component or complicated signal processing.

Keywords

displacement measurement; light interferometry; measurement by laser beam; photodetectors; displacement measurement; frequency-modulated lasers; grating formation; noncollinear coherent light waves; photo-electromotive force effect; submicron resolution; transient response; Diode lasers; Displacement measurement; Force measurement; Frequency; Gratings; Laser beams; Silicon compounds;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2000. (CLEO 2000). Conference on

Conference_Location

San Francisco, CA, USA

Print_ISBN

1-55752-634-6

Type

conf

DOI

10.1109/CLEO.2000.906779

Filename

906779