Title :
193-nm generation by eighth harmonics of Er/sup 3+/-doped fiber amplifier
Author :
Ohtsuki, Tomoaki ; Kitano, Hrioaki ; Kawai, Hiroyuki ; Owa, S.
Author_Institution :
Core Tech. Center, Nikon Corp., Tokyo, Japan
Abstract :
Summary form only given. Narrow-band, ultraviolet laser sources are essential for high-resolution measurement and testing. In particular, sources operating at 193-nm wavelength are important for micro-lithographic applications, allowing the testing and alignment of lithographic imaging systems at the ArF exposure wavelength. We believe we report the first narrow-band 193-nm source using eighth harmonic generation from the output of an Er-doped fiber amplifier. Several different frequency conversion processes are possible in order to obtain 193-nm eighth harmonic from 1547 nm.
Keywords :
erbium; laser transitions; light sources; optical fibre amplifiers; optical harmonic generation; 1547 nm; 193 nm; 193-nm generation; 193-nm wavelength; ArF exposure wavelength; Er-doped fiber amplifier; Er/sup 3+/-doped fiber amplifier; alignment; eighth harmonic generation; eighth harmonics; frequency conversion processes; high-resolution measurement; lithographic imaging system testing; lithographic imaging systems; micro-lithographic applications; narrow-band ultraviolet laser sources; optical testing; Absorption; Crystals; Erbium; Optical pulse generation; Optical pulses; Optical solitons; Petroleum; Pulse measurements; Space vector pulse width modulation; Ultrafast optics;
Conference_Titel :
Lasers and Electro-Optics, 2000. (CLEO 2000). Conference on
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
1-55752-634-6
DOI :
10.1109/CLEO.2000.906788
