DocumentCode
2920796
Title
2D Photonic Crystal Structures Fabricated by Nanosphere Lithography
Author
Hao, Zhibiao ; Han, Shuo ; Wang, Jian ; Luo, Yi
Author_Institution
State Key Laboratory on Integrated Optoelectronics, Department of Electronic Engineering, Tsinghua University, P.R. China; zbhao@tsinghua.edu.cn
fYear
2005
fDate
30-02 Aug. 2005
Firstpage
235
Lastpage
236
Abstract
Two-dimensional photonic crystal (PC) structures have been successfully fabricated by a substrate-independent nanosphere lithography method. The air-filling factors of the PC patterns can be accurately controlled by thinning the polymer nanospheres using O2 plasma.
Keywords
nanosphere lithography; photonic crystal; self-assembly; Dielectric substrates; Etching; Gallium arsenide; Lithography; Nanostructures; Photonic crystals; Plasma applications; Plasma sources; Polymers; Self-assembly; nanosphere lithography; photonic crystal; self-assembly;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2005. CLEO/Pacific Rim 2005. Pacific Rim Conference on
Print_ISBN
0-7803-9242-6
Type
conf
DOI
10.1109/CLEOPR.2005.1569407
Filename
1569407
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